Abstract: A measurement method of measuring deflection of a mold by measuring Newton's rings obtained by pressing the mold on a substrate with a resist interposed therebetween and irradiating the substrate with light via the mold includes: performing the pressing through the resist having a height less than an optical distance ?/4, ? being a wavelength of the light; measuring peak positions of the Newton's rings in a contact boundary portion between the mold and the substrate in a region in which a gap between the mold and the substrate is less than the optical distance ?/4; and calculating the deflection of the mold based on the peak positions.

Abstract: An analysis method of analyzing a process for manufacturing a semiconductor device, includes a preparing step of preparing a plurality of data sets each including an input to a simulator that simulates the process and an output from the simulator, a generating step of generating, based on the plurality of data sets, a plurality of learning data having, as a value of an explanatory variable, a value of information, of process information associated with at least one of control and a state of the process, to which attention is to be paid and a value of evaluation information for evaluating the process as a valued of an objective variable, and a learning step of generating a model expressing the process by performing learning based on the plurality of learning data generated in the generating step.

Abstract: An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, includes a mold holding unit including an actuator for moving mold, a force sensor detecting force generated by actuator, a position sensor measuring a position of mold, and a controlling unit controlling operation of mold holding unit. The controlling unit controls mold holding unit according to either a force imprint profile or a position imprint profile. The force imprint profile is for controlling movement of mold based on force generated by actuator and detected by force sensor. The position imprint profile is for controlling movement of mold based on position of mold measured by position sensor. When pattern of imprint material is formed on substrate, either force imprint profile or position imprint profile is selectable.

Abstract: There is provided a molding apparatus that molds a composition on a substrate by using a mold, characterized by including a control unit configured to control a process of forming a film of the composition between a first surface of the mold and the substrate by bringing the first surface into contact with the composition, and a deforming unit configured to deform the first surface into a convex shape with respect to a substrate side by applying power to a second surface of the mold on an opposite side to the first surface, wherein the control unit controls the deforming unit in the process so as to make power applied to the second surface by the deforming unit after contact between the first surface and the composition larger than power applied to the second surface by the deforming unit before the contact between the first surface and the composition.

Abstract: An imprint apparatus performs an imprint process of forming a pattern on a substrate by bringing a mold into contact with an imprint material on the substrate and curing the imprint material. The apparatus includes a substrate stage mechanism having a substrate chuck configured to hold the substrate, a mold driver configured to drive the mold, and a controller configured to control, based on tilt information indicating a tilt of the substrate chuck which is caused by a force received from the mold driver, the mold driver so as to adjust a relative tilt of the mold with respect to the substrate in the imprint process.

Abstract: An imprint method includes arranging imprint material as droplets on shot region of substrate, bringing the imprint material on part of the shot region into contact with pattern region of mold and then enlarging contact region between the imprint material and the pattern region to whole region of the shot region, and curing the imprint material. in the arranging, in each of local regions located in radial direction from the part of the shot region, the imprint material is arranged such that directional drop density of the imprint material on line parallel to direction orthogonal to the radial direction and with droplets of the imprint material present thereon is smaller than that of the imprint material on line parallel to the radial direction and with droplets of the imprint material present thereon.

Abstract: An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, includes a mold holding unit including an actuator for moving mold, a force sensor detecting force generated by actuator, a position sensor measuring a position of mold, and a controlling unit controlling operation of mold holding unit. The controlling unit controls mold holding unit according to either a force imprint profile or a position imprint profile. The force imprint profile is for controlling movement of mold based on force generated by actuator and detected by force sensor. The position imprint profile is for controlling movement of mold based on position of mold measured by position sensor. When pattern of imprint material is formed on substrate, either force imprint profile or position imprint profile is selectable.

Abstract: The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate by using a mold, the apparatus comprising a control unit configured to control a process of deforming the mold into a convex shape and bringing the mold and the imprint material into contact with each other, wherein the control unit determines, based on information indicating a relationship between a relative tilt between the mold and the substrate, and a moment which fluctuates the relative tilt at a time of contact between the mold and the imprint material, a target relative tilt such that a moment generated at the time of contact between the mold and the imprint material falls within an allowable range, and starts contact between the mold and the imprint material after setting the relative tilt to the target relative tilt.

Abstract: The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.

Abstract: An imprint method includes arranging imprint material as droplets on shot region of substrate, bringing the imprint material on part of the shot region into contact with pattern region of mold and then enlarging contact region between the imprint material and the pattern region to whole region of the shot region, and curing the imprint material. in the arranging, in each of local regions located in radial direction from the part of the shot region, the imprint material is arranged such that directional drop density of the imprint material on line parallel to direction orthogonal to the radial direction and with droplets of the imprint material present thereon is smaller than that of the imprint material on line parallel to the radial direction and with droplets of the imprint material present thereon.

Abstract: The present invention provides a mold having a concave-convex pattern, the pattern being transferred onto an imprint material on a substrate by an imprint apparatus, the mold comprising: a first surface having a pattern portion on which the pattern; and a second surface located on an opposite side to the first surface, wherein a concave portion that does not penetrate to the second surface is provided in the first surface so as to be spaced apart from the pattern portion.

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract: The present invention provides an imprint apparatus which transfers a pattern onto a substrate by using a mold including a first surface with a pattern region where an unevenness pattern is formed, and a second surface opposite to the first surface, the mold including a first pattern group formed between the second surface and a surface of a convex portion in the unevenness pattern, or on the second surface, the apparatus comprising a second pattern group, a detection unit configured to detect a mark group formed by light having passed through the first pattern group and the second pattern group, and a calculation unit configured to calculate a position deviation between the first pattern group and the second pattern group from the mark group detected by the detection unit.

Abstract: The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.

Abstract: The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate by using a mold, the apparatus comprising a control unit configured to control a process of deforming the mold into a convex shape and bringing the mold and the imprint material into contact with each other, wherein the control unit determines, based on information indicating a relationship between a relative tilt between the mold and the substrate, and a moment which fluctuates the relative tilt at a time of contact between the mold and the imprint material, a target relative tilt such that a moment generated at the time of contact between the mold and the imprint material falls within an allowable range, and starts contact between the mold and the imprint material after setting the relative tilt to the target relative tilt.

Abstract: The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.

Abstract: An imprint apparatus performs an imprint process of forming a pattern on a substrate by bringing a mold into contact with an imprint material on the substrate and curing the imprint material. The apparatus includes a substrate stage mechanism having a substrate chuck configured to hold the substrate, a mold driver configured to drive the mold, and a controller configured to control, based on tilt information indicating a tilt of the substrate chuck which is caused by a force received from the mold driver, the mold driver so as to adjust a relative tilt of the mold with respect to the substrate in the imprint process.

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract: A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.